Sputtering Targets for Flat Panel Display Applications
- We support sputtering targets for all fields including TFT, OLED (LTPS: Low-temperature polysilicon) and touch panels.
- Ultrasonic defect testers ensure meticulous quality assurance! ULVAC has installed large ultrasonic test equipment to make meticulous defect inspections of materials and bonding inspections. Using this equipment has helped ULVAC drastically cut down on arcing during sputtering and deliver high quality targets.
- High-reliability metal bonding technology
Large sputtering targets are very heavy so technology for bonding to a cooling plate (backing plate) is extremely important. ULVAC has installed bonding equipment to support deposition of larger glass substrate, and realized an all-inclusive target supply system. - Low-particle targets
- Attaining high uniformity by adjusting the metal microstructure
Cu-Mg-Al Alloy for Low-Resistance Copper Wiring
- Ideal target for deposition forming in low-resistance wiring processes. (Stacking structure uses Cu-Mg-Al alloy as adhesion layer for pure copper film)
- Good adhesion to glass substrates, oxide layers (ITO, etc.), and silicon system under layers (SiO2).
- Wet etch processing is easy because the copper material is similar to the wiring layer material. (Processing can also use etching solution (single fluid) not containing hydrogen peroxide or fluoric acid.)
- Low-cost process
- Inexpensive target material
Sputtering Targets for FPD
Application Field | Materials | Purpose of Use |
---|---|---|
Low temperature poly-Si TFT materials | Al(5N) & Al alloy | Wiring materials |
Mobile terminals/monitors | Ti(4N5) | Electrode/barrier materials |
Mo(3N) | Electrode/barrier materials | |
ITO(4N) | Transparent conductive films | |
High temperature poly-Si TFT materials | AlSi(5N) & AlCu(5N) | Wiring materials |
Rear projection televisions | Ti(4N5) | Electrode/barrier materials |
High-definition monitors | WSi | Electrode materials |
ITO(4N) | Transparent conductive films | |
PDP | Al(5N) & Al alloy | Wiring materials |
PDP-TV | Cr(3N) | Barrier/ adhesion film materials |
Cu(4N) | Wiring materials | |
ITO(4N) | Transparent conductive films | |
OLED (organic EL) materials | ITO(4N) | Transparent conductive films |
Mobile terminals | Ag & Ag alloy | Reflective/ electrode |
Mg | Electrode | |
Al & Al alloy | Wiring/electrode | |
FED/SED materials | Al(5N) & Al alloy | Wiring materials |
Monitors/TVs | Cr(3N) | Barrier/ adhesion film materials |
Various precious metals(4N) | Wiring materials | |
ITO(4N) | Transparent conductive films | |
Nb(3N) | Electrode materials | |
STN, color filter materials | Si & SiO2(4N) | Insulating/under-layer material |
Mobile phones/terminals | Cr(3N) | BM materials |
Ag alloy(4N) | STN reflective electrode materials | |
ITO(4N) | Transparent conductive films | |
Amorphous Si-TFT materials | Al(5N) & AlCe alloy | Wiring materials |
Cu(4N) & Cu alloy | Wiring materials | |
Mo(3N) | Electrode/barrier materials | |
Cr(3N) | Electrode/barrier materials | |
Ti(3N) | Electrode/barrier materials | |
ITO(4N) | Transparent conductive films |