Nano-Metal Ink „Ag, L-Ag, Au, ITO Series“
- produced by Gas Evaporation Method
NANOMETAL INKs are produced by the Gas Evaporation Method. These newly developed inks consist of metal nanoparticles dispersed stably and not aggregated in some organic solvent. The inks enable to form electro-conductive fine patterns directly by printing processes such as ink-jet printing.
Nano Metal Ink
| Name of Products | Au-Nanometal Ink | Ag-Nanometal Ink | Ag-Nanometal Ink (Low temperature type) |
ITO Nanometal Ink | |||
|---|---|---|---|---|---|---|---|
| Type of Number | Au1T | Ag1T | Ag1teH | L-Ag1T | L-Ag1TeH | ITO 1Cden | |
| For Ink Jet | X | X | ○ | X | ○ | ○ | |
| Metal Content (wt%) | 30 | 30 | 55〜60 | 30 | 55〜60 | 20 | |
| Sovlent | Toluene | Toluene | Tetradecane | Toluene | Tetradecane | Cyclododecene | |
| Adhesive Inproving Additives |
– | – | – | – | – | – | |
| Average Particle Size (mm) |
3〜7 | ||||||
| Viscocity (mPa·s) | <5 | <5 | 5〜15 | <5 | 5〜15 | 5〜15 | |
| Cured-film performance below is a refference only, NOT guaranteed | |||||||
| Curing Condition | 350℃x30min or 300℃x30min |
220℃x30min | 150℃x60min | *1 | |||
| Layer After Curing (μm) |
<1 | <1 | <1 | <1 | <1 | – | |
| Resistivity (μΩ·cm) | 350℃x30min: 8〜10 300℃x30min: 12〜15 |
approx. 3 | approx. 3 | approx. 10 | – | ||
| Substrates to be used | 350℃x30min:8〜10 300℃x30min:12〜15 |
Heat-resistant temperature of substrates should be higher than curing temperature. | |||||
| Adhesive Strength (kg/mm2) |
<1 | <1 | <1 | <1 | <1 | >2 | |
*1 230℃x10min in 8Pa in vacuum + 230℃x60min in air
