- COMPONENTS
- Vacuum Pumps
- Dry Pumps
- Screw Type Dry Vacuum Pump LS Series 120A
- Dry Vacuum Pump MS Series
- Scroll Type Dry Vacuum Pumps DIS Series
- Scroll Type Dry Vacuum Pumps DISL Series
- Diaphragm Type Dry Vacuum Pump DTC Series
- Diaphragm Type Dry Vacuum Pump DAU-20/DTU-20
- Diaphragm Type Dry Vacuum Pump DA Series
- Diaphragm Type Dry Vacuum Pump DAP Series
- Dry Vacuum Pump CR Series
- Dry Vacuum Pump LR/HR/UR Series
- Dry Vacuum Pump CR Series Version B
- Dry Vacuum Pump GR Series
- Rocking Piston Type Dry Vacuum Pumps DOP Series
- Oil Rotary Pumps
- Mechanical Booster Pumps
- Ion Pumps
- Turbo Molecular Pumps
- Oil Diffusion Pumps
- Cryo Pumps
- Accessories
- Dry Pumps
- Vacuum Gauges
- G-TRAN Series Pressure Switch Unit (SAU)
- Ceramic Capacitance Manometer, CCMT-D Series
- Extreme High Vacuum Gauge AxTRAN
- G-TRAN Series Pirani Gauge Sensor Unit SP1
- Atmospheric Pirani Gauge Combo SW1 & ISG1
- G-TRAN Series 4CH Display Unit IM1R1, IM2R1
- Cold Cathode Gauge Sensor Unit G-Tran Series SC1
- Multi Ionization Gauge G-TRAN Series ST2-1, ST2-2
- Smartphone-Direct Pirani Gauge SWU10-U
- Process Gas Monitor
- Leak Detectors
- Thin Film Measurement / Deposition Controller
- Vacuum Valves
- Power Generator
- Molecular Interaction Analyzer
- Thermal Analysis
- Vacuum Pumps
- Equipment
- By technology
- By application
- Advanced Packaging Device
- Architectural Glass
- Automobile Parts
- Automotive
- Aviation – Airplane Parts
- Air Conditioning and Refrigeration (ACR)
- Decorative Coating
- Electronic Materials
- EMI Shielding
- Food & Medicine
- Food Processing
- Health Care
- Functional Materials
- Display
- LED Device
- Magnetic Device
- Magnet Materials
- MEMS Device
- OLED
- Optical Film
- Pharmaceutical
- Photovoltaic
- Power Device
- Medium Current Ion Implanter SOPHI-400
- Activation Annealing System Ailesic-2000
- Oxidation-Nitridization-Annealing System Ailesic 1400-1700
- High-temp Ion Implanter for SiC IH-860PSIC
- Medium Current Ion Implanter SOPHI-200/260
- Dry Etching System for Production NE-5700 & NE-7800
- Load-lock-type Plasma CVD System CC-200/400 PD
- Back Side Metallization Sputtering System SRH-530 pd
- R&D Equipment for Displays
- Semiconductor Process (FEOL/BEOL)
- Semiconductor Process (Non Volatile Memory)
- Thin Film Deposition
- Thin Film Battery
- Touch Panel
CLUSTER-TYPE PE-CVD SYSTEM CME-SERIES
CME-200E/400 is the most suitable model in the PE-CVD series production system for deposition of Si films with application as Insulator or barrier layers.
- High-density plasma process with high-frequency (27.12 MHz) power supply
- High-quality film using SiH4 precursor: SiO2, SiNx, SiON, a-Si, also for TEOS process for SiO2 film
- Chamber Cleaning with NF3+Ar plasma
- Substrate size up to 200 x 200mm for CME-200E, max. 300 x 400mm for CME-400
SPECIAL FEATURES / FURTHER APPLICATIONS
- Supports the heater for low-temperature deposition of organic EL.
Further Applications
- Power device
- LED, LD, High-speed device
- Solar cell
- MEMS
