Products

 •    Products  •    Components  •    Process Gas Monitor

Qulee Residual Gas Analyzers and Process Gas Monitors: Precise Measuring Instruments for Sputter, CVD, and Vacuum Processes

The ULVAC Qulee series combines advanced process gas monitoring with the precision of a quadrupole mass spectrometer. The gas analyzers measure the composition of process gases in real time, enabling rapid leak, moisture, and impurity detection. Their application spans from sputter systems and vacuum furnace to complex CVD/ALD processes and research facilities.

Compact Process Gas Monitor - Qulee BGM2-Series
  • Excellent in Cost Performance
  • Integrated Display
  • Simple Operation
Sputtering Process Qulee CGM2 Series
  • Mass range 1-100 AMU
  • Monitoring of residual hydrocarbons
  • Various leak tests available (Helium leak test, air leak test, assembly test)
High Performance Process Gas Monitor - Qulee HGM2 Series
  • Most Appropriate for R&D Applications
  • Bake Out max 250˚C
  • Various Leak Tests are Available
Reactive Process Gas Monitoring System - Qulee RGM2 Series
  • Unique Closed Ion Source with magnet enables
  • Sensitive ionization chamber
  • Reduces the distance from the process chamber to the ion source
Qulee Series Option
High Pressure Process Qulee with YTP-H Series for Vacuum (1, 10, 100, 500, 3000Pa)
High Pressure Process Qulee with YTP-H Series for Atmospheric Pressure
  • Excellent Cost Performance
  • Easy to Operate
  • Atmospheric Pressure Analysis
High Pressure Process Qulee with YTP-H Series for Vacuum (1, 10, 100, 500, 3000Pa)
High Pressure Process Qulee with YTP-H Series for Vacuum (1, 10, 100, 500, 3000Pa)
  • Excellent Cost Performance
  • Easy to Operate
  • Atmospheric Pressure Analysis

Qulee Process Gas Monitors: Product Overview

Qulee BGM2 Series (Basic Process Gas Monitoring)

  • Core Application: Ideal for evaporation systems and vacuum furnace, perfect for general process monitoring and quality control.
  • Features: Easy to use, Ethernet connectivity, models BGM2-101/102 and 201/202 offer optional higher sensitivity and excellent price-performance ratio.
Qulee CGM2 Series (Compact Process Gas Monitors)

  • Core Application: Developed for sputter processes, ideal for leak and residual moisture monitoring as well as impurity control.
  • Features: High accuracy down to 1 Pa, models CGM2-051/052 and CGM2-101/102. Supports leak tests (helium, air, mounting test).
Qulee HGM2 Series (High-Performance Process Gas Monitors)

  • Core Application: High-end devices for ultra-high vacuum and research, perfect for R&D applications where high sensitivity is required.
  • Features: Minimum detectable partial pressure of 10⁻¹³ Pa, models HGM2-202/302.
Qulee RGM2 Series (Reactive Process Gas Monitoring)

  • Core Application: Specifically developed for CVD, ALD, and etching processes, providing long-term stable measurements even with corrosive gases.
  • Features: Models RGM2-201F/202/302 feature differentially pumped inlet systems and robust ion sources, support endpoint detection and process optimization.
Qulee YTP-H Series (High Pressure/Atmospheric)

  • Core Application: Variants with differential pumping systems for high process pressures (1 Pa – 3000 Pa) or atmospheric pressure, ideal for vacuum furnace, atmospheric analysis, environmental monitoring, and exhaust gas analysis.
  • Features: Easy to use, excellent price-performance ratio.

Industries

  • Semiconductor and Microelectronics Industry: Process engineers in sputter, CVD, ALD, and etching systems benefit from precise gas monitoring to increase yield.
  • Thin Film and Coating Industry: Operators of evaporation systems and vacuum furnace use the BGM2 and YTP-H variants for residual moisture, leak, and gas purity control.
  • Research and Development Laboratories: Universities and corporate labs use the HGM2 models for ultra-high vacuum experiments and materials research.
  • System Manufacturers and OEMs: Integrate process gas monitors as quality and safety components in complete systems.
  • Environmental and Catalysis Research: YTP-H atmospheric variants are ideal for exhaust gas, environmental, or catalyst reactor analysis.

Applications

  1. Real-time Process Monitoring: Quadrupole mass spectrometry provides rapid analysis of gas compositions, support endpoint detection during etching or cleaning processes and preventing over-etching.
  2. Leak and Moisture Testing: The Qulee series detects the smallest leaks and moisture ingress in vacuum systems, improving process quality.
  3. Process Optimization: By monitoring reactants and byproducts in CVD/ALD processes, gas ratios can be optimized and yield increased.
  4. Ultra-High Vacuum Analysis: HGM2 devices measure extremely low partial pressures, enabling the study of materials and surfaces under the purest conditions.
  5. Atmospheric and Environmental Protection: YTP-H variants analyze process gases at high or atmospheric pressures; useful for environmental measurements, catalytic reactions, and exhaust gas analysis.

Benefits of the Qulee Series

  • Wide Range of Applications: One series covers everything from sputtering (CGM2), evaporation (BGM2), relevant CVD/ALD processes (RGM2) to ultra-high vacuum research (HGM2) and atmospheric analysis (YTP-H).
  • High Precision & Sensitivity: Quadrupole mass spectrometry enables high-resolution measurements, e.g., 10⁻¹³ Pa for the HGM2 series.
  • Easy to Use: Ethernet-enabled devices with integrated displays, one-touch start, and user-friendly software (QCS) facilitate integration and operation.
  • Long-Term Stability: RGM2 models offer corrosion-resistant ion sources and differentially pumped inlets for reactive gases, ensuring long-term process stability.
  • Flexibility in Pressure Ranges: YTP-H variants allow measurements from ultra-high vacuum to atmospheric pressure.
    With the Qulee series, ULVAC offers a modular portfolio that can be easily integrated into existing systems, covering the needs of both series production and research.