• Products • Equipment • By technology • Plasma-Etching • Dry Etching System for MEMS production NLD-5700
- COMPONENTS
- Vacuum Pumps
- Dry Pumps
- Screw Type Dry Vacuum Pump LS Series 120A
- Screw Type Dry Vacuum Pump LS Series LS300A
- Screw Type Dry Vacuum Pump LS Series LS 600A
- Screw Type Dry Vacuum Pump LS Series LS 1200A
- Dry Vacuum Pump MS Series
- Scroll Type Dry Vacuum Pumps DIS Series
- Scroll Type Dry Vacuum Pumps DISL Series
- Diaphragm Type Dry Vacuum Pump DTC Series
- Diaphragm Type Dry Vacuum Pump DAU-20/DTU-20
- Diaphragm Type Dry Vacuum Pump DA Series
- Diaphragm Type Dry Vacuum Pump DAP Series
- Dry Vacuum Pump CR Series
- Dry Vacuum Pump LR/HR/UR Series
- Dry Vacuum Pump CR Series Version B
- Dry Vacuum Pump GR Series
- Rocking Piston Type Dry Vacuum Pumps DOP Series
- Oil Rotary Pumps
- Oil Sealed Rotary Vacuum Pump GHD-031
- Oil Sealed Rotary Vacuum Pump GLD Series
- Oil Rotary Vacuum Pump VD-Series
- Oil Rotary Vacuum Pump VD-Series 901
- Oil Rotary Vacuum Pump VS1501, VS2401
- Oil Rotary Vacuum Pump VS300A-W
- Oil Rotary Vacuum Pump VS650A
- Oil Rotary Vacuum Pump PKS Series
- Oil-sealed Rotary Vacuum Pump PVD Series
- Mechanical Booster Pumps
- Ion Pumps
- Turbo Molecular Pumps
- Oil Diffusion Pumps
- Cryo Pumps
- Accessories
- Dry Pumps
- Vacuum Gauges
- Multi Ionization Gauge G-TRAN Series ST200-A/R/E
- Multi Ionization Gauge G-TRAN Series SH200-A/R/E
- Pirani Vacuum Gauge Transducer Type SW100 SW100-A / R
- G-TRAN Series Pirani Gauge Sensor Unit SP1
- Smartphone-Direct Pirani Gauge SWU10-U
- Ceramic Capacitance Manometer, CCMT-D Series
- G-TRAN Series Pressure Switch Unit (SAU)
- Cold Cathode Gauge Sensor Unit G-Tran Series SC1
- G-TRAN ISG1
- Extreme High Vacuum Gauge AxTRAN
- Process Gas Monitor
- Basis Process Gas Monitor – Qulee BGM Series
- Compact Process Gas Monitor – Qulee CGM Series
- Compact Process Gas Monitor – Qulee CGM2 Series
- High Performance Process Gas Monitor – Qulee HGM Series
- Reactive Process Gas Monitoring System – Qulee RGM2 Series
- Qulee Series Option
- High Performance Process Gas Monitor – Qulee with YTP-H For Atmospheric Pressure
- High Performance Process Gas Monitor – Qulee with YTP-H Series for Vacuum
- Leak Detectors
- Thin Film Measurement / Deposition Controller
- Vacuum Valves
- Power Generator
- Thermo Electric Evaluation
- Vacuum Pumps
- Equipment
- By technology
- By application
- Advanced Packaging Device
- Automobile Parts
- Automotive
- Aviation – Airplane Parts
- Air Conditioning and Refrigeration (ACR)
- Food & Medicine
- LED Device
- Magnetic Device
- MEMS Device
- OLED
- Optical Film
- Power Device
- Medium Current Ion Implanter SOPHI-400
- Activation Annealing System Ailesic-2000
- Oxidation-Nitridization-Annealing System Ailesic 1400-1700
- High-temp Ion Implanter for SiC IH-860PSIC
- Medium Current Ion Implanter SOPHI-200/260
- Dry Etching System for Production NE-5700 & NE-7800
- Load-lock-type Plasma CVD System CC-200/400 PD
- Back Side Metallization Sputtering System SRH-530 pd
- Semiconductor Process (FEOL/BEOL)
Dry Etching System for MEMS production NLD-5700
Production type dry etching system with ULVAC original NLD (Neutral Loop Discharge) Plasma Source.
- ICP type etching chamber, CCP or Ashing chamber is also selectable as 2nd chamber.
- Low process pressure, high density plasma, low electron temperature are perfect for quartz glass, Pyrex, LN, LT etc.
- Good profile control and surface roughness.
- Good performance of deep SiO2 etching with PR.
- High etching rate of Quartz > 1μm/min, Pyrex > 0.8 μm/min.
- Excellent uniformity control.
Special Features / Further Applications
- Optical Devices (Wave guide, amplifier, optical switch etc), Micro lens, Photonics, μ-TAS etc.