ULVAC’s Sputtering Systems
ULVAC’s sputtering systems have the best track record in the industry.
- Triple-gun cathode
- Outstanding controllability
- Compact footprint
- Capability to deposit cosmetic films over EMI shield
- Low temperature process
- Footprint 0.9 x 2.3 m
- Designed for small production
- annealing at 2000°C for sputtered carbon
- Single to Tandem Core Platform
- High Performance
- High Reliability
- ESC method available
- Size 125 to 200 mm
- Up to 5 process recipes
- Easy maintenance
- Outstanding film stress control and particle reduction
- High-quality deposition
- Multi types of Sputter, Etcher, Asher & PE-CVD can be equipped
- All types of above models are made by ULVAC
- Up to 300mm wafer is applicable