Cluster-type PE-CVD System CME-Series
CME-200E/400 is the most suitable model in the PE-CVD series production system for deposition of Si films with application as Insulator or barrier layers.
- High-density plasma process with high-frequency (27.12 MHz) power supply
- High-quality film using SiH4 precursor: SiO2, SiNx, SiON, a-Si, also for TEOS process for SiO2 film
- Chamber Cleaning with NF3+Ar plasma
- Substrate size up to 200 x 200mm for CME-200E, max. 300 x 400mm for CME-400
SPECIAL FEATURES / FURTHER APPLICATIONS
- Supports the heater for low-temperature deposition of organic EL.
- Power device
- LED, LD, High-speed device
- Solar cell