Dry Etching Tool APIOS NE-950EX
Our LED Mass Productive System NE-950EX is equipped with 2 of our patented inventions and offers beside a outstanding output capacity, high maintainability, stability, reliability by its innovative design.
- Higher Through-Put（140% compared to a conventional systems)
- 3 wafers batch processing availability in 6inch dia.
- 7 wafers batch processing availability in 4inch dia.
- 12 wafers batch processing availability in 3 inch dia.
- 29 wafers batch processing availability in 2 inch dia.
- ICP with magnetic field ISM *1), high density plasma source which has over 600 delivery record in compound semiconductor market*1:ULVAC Patent No.3188353
- Propriately Star electrode*2) which has self-cleaning function for deposited material from RF window*2:ULVAC Patent No.3429391
- High maintainability, stability, reliability are achieved through re-deposition preventative design
Special Features / Further Applications
- Dry etching technology availability for various process applications (GaN, Sapphire, Metal, ITO, SiC, AlN, ZnO, 4 elements compound semiconductor materials, etc.)
- Various Options available