Batch-type High Vacuum Evaporation System ei-Series
This is a batch type high vacuum evaporation system for the deposition of metal and oxide on a substrate. Since the operation panel of this system has an integrated control function that realizes automated vacuum and deposition process, it is recommended for R&D use as well as for small-scale manufacturing.
- Supports various evaporation sources (i.e. EB, RH, EB + RH etc.).
- Substrate holders complying with each process (i.e. lift-off, planetary, satellite etc.).
- Supports various substrates; substrates size from φ2in to 6in, rectangular substrates, Si, compounds, glass and ceramics.
- Display and operation on LCD touch panel.
- Superior PC-operating system and functions (recipe function, data logging, maintenance assist function).
SPECIAL FEATURES / FURTHER APPLICATIONS
- Compound-related devices of Power devices.
- LED, LD and high-speed devices.
- Various R&D Applications.
- Other general electronic devices.
