Medium Current Ion Implanter SOPHI-200/260
This tool, SOPHI-400, basically inherits exisiting medium current production model ion implanter, and remove over specification based on our sufficient experience as tool supplier. Therefore, thanks to effective cost reduction, we can offer inexpensive sales price with parallel scan capability.
- Applicable for 4 – 8 inch wafers.
- Compact and light weight tool.
- Excellent parallel beam performance.
- Excellent for engergy and metal contamination.
- Applicable for ultra thin wafers.
- 400kV single / 800kV double / 1,2MV for triple charge
- Proton implantation available
SPECIAL FEATURES / FURTHER APPLICATIONS
- Semiconductor production.
- Ultra thin wafers process such as power devices, etc.
- Proton implantation