• Products • Equipment • By technology • Annealing and Oxidation • Oxidation-Nitridization-Annealing System Ailesic 1400-1700
- COMPONENTS
- Vacuum Pumps
- Dry Pumps
- Screw Type Dry Vacuum Pump LS Series 120A
- Dry Vacuum Pump MS Series
- Scroll Type Dry Vacuum Pumps DIS Series
- Scroll Type Dry Vacuum Pumps DISL Series
- Diaphragm Type Dry Vacuum Pump DTC Series
- Diaphragm Type Dry Vacuum Pump DAU-20/DTU-20
- Diaphragm Type Dry Vacuum Pump DA Series
- Diaphragm Type Dry Vacuum Pump DAP Series
- Dry Vacuum Pump CR Series
- Dry Vacuum Pump LR/HR/UR Series
- Dry Vacuum Pump CR Series Version B
- Dry Vacuum Pump GR Series
- Rocking Piston Type Dry Vacuum Pumps DOP Series
- Oil Rotary Pumps
- Mechanical Booster Pumps
- Ion Pumps
- Turbo Molecular Pumps
- Oil Diffusion Pumps
- Cryo Pumps
- Accessories
- Dry Pumps
- Vacuum Gauges
- G-TRAN Series Pressure Switch Unit (SAU)
- Ceramic Capacitance Manometer, CCMT-D Series
- Extreme High Vacuum Gauge AxTRAN
- G-TRAN Series Pirani Gauge Sensor Unit SP1
- Atmospheric Pirani Gauge Combo SW1 & ISG1
- G-TRAN Series 4CH Display Unit IM1R1, IM2R1
- Cold Cathode Gauge Sensor Unit G-Tran Series SC1
- Multi Ionization Gauge G-TRAN Series ST2-1, ST2-2
- Smartphone-Direct Pirani Gauge SWU10-U
- Process Gas Monitor
- Leak Detectors
- Thin Film Measurement / Deposition Controller
- Vacuum Valves
- Power Generator
- Molecular Interaction Analyzer
- Thermal Analysis
- Vacuum Pumps
- Equipment
- By technology
- By application
- Advanced Packaging Device
- Architectural Glass
- Automobile Parts
- Automotive
- Aviation – Airplane Parts
- Air Conditioning and Refrigeration (ACR)
- Decorative Coating
- Electronic Materials
- EMI Shielding
- Food & Medicine
- Food Processing
- Health Care
- Functional Materials
- Display
- LED Device
- Magnetic Device
- Magnet Materials
- MEMS Device
- OLED
- Optical Film
- Pharmaceutical
- Photovoltaic
- Power Device
- Medium Current Ion Implanter SOPHI-400
- Activation Annealing System Ailesic-2000
- Oxidation-Nitridization-Annealing System Ailesic 1400-1700
- High-temp Ion Implanter for SiC IH-860PSIC
- Medium Current Ion Implanter SOPHI-200/260
- Dry Etching System for Production NE-5700 & NE-7800
- Load-lock-type Plasma CVD System CC-200/400 PD
- Back Side Metallization Sputtering System SRH-530 pd
- R&D Equipment for Displays
- Semiconductor Process (FEOL/BEOL)
- Semiconductor Process (Non Volatile Memory)
- Thin Film Deposition
- Thin Film Battery
- Touch Panel
Oxidation-Nitridization-Annealing System Ailesic 1400-1700
SiC power device recently became a key technology to realize a ‚low-carbon society‘. The Oxidation/Nitridization/Annealing system Ailesic 1400-1700 from our partner Toyoko Kagaku is our solution to assure you improved performance of the SiC thermal processes and a stable mass production in the activation anneal process.
- automatic C2C high throughput vertical furnace for up to 150mm substrates
- Oxidation, Oxynitriding (O2, N2O, NO), Annealing (Ar, N2)
- operational temp. for Ailesic-1400 is 700…1350°C (max. 1400°C)
- operational temp. for Ailesic-1700 is 700…1650°C (max. 1670°C)
- heating rate for Ailesic-1400 is ≤20°C and for Ailesic-1700 is ≤100°C
- batch size is 50 wafers for Ailesic-1400 and 25 wafers for Ailesic-1700
- high uniformity of ≤±0.5% for SiO2 within wafer
- very low metal contamination of ＜1.0E+11 atoms/cm2
- long life metal heater (>5 years)
- high temperature uniformity of ±3K
- insitu cleaning technology
- footprint 1.1m x 3.9m
SPECIAL FEATURES / FURTHER APPLICATIONS
- Oxidation ( O2, Pyrogenic )
- Nitridization ( N2O, NO )
- Anneal ( N2, Ar, H2, NH3 )
- Post Oxidation Anneal
