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Oxidation-Nitridization-Annealing System Ailesic 1400-1700

SiC power device recently became a key technology to realize a ‚low-carbon society‘. The Oxidation/Nitridization/Annealing system Ailesic 1400-1700 from our partner Toyoko Kagaku is our solution to assure you improved performance of the SiC thermal processes and a stable mass production in the activation anneal process.

Features

  • automatic C2C high throughput vertical furnace for up to 150mm substrates
  • Oxidation, Oxynitriding (O2, N2O, NO), Annealing (Ar, N2)
  • operational temp. for Ailesic-1400 is 700…1350°C (max. 1400°C)
  • operational temp. for Ailesic-1700 is 700…1650°C (max. 1670°C)
  • heating rate for Ailesic-1400 is ≤20°C and for Ailesic-1700 is ≤100°C
  • batch size is 50 wafers for Ailesic-1400 and 25 wafers for Ailesic-1700
  • high uniformity of ≤±0.5% for SiO2 within wafer
  • very low metal contamination of ＜1.0E+11 atoms/cm2
  • long life metal heater (>5 years)
  • high temperature uniformity of ±3K
  • insitu cleaning technology
  • footprint 1.1m x 3.9m

SPECIAL FEATURES / FURTHER APPLICATIONS

  • Oxidation ( O2, Pyrogenic )
  • Nitridization ( N2O, NO )
  • Anneal ( N2, Ar, H2, NH3 )
  • Post Oxidation Anneal

Any questions?

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