- COMPONENTS
- Vacuum Pumps
- Dry Pumps
- Screw Type Dry Vacuum Pump LS Series 120A
- Dry Vacuum Pump MS Series
- Scroll Type Dry Vacuum Pumps DIS Series
- Scroll Type Dry Vacuum Pumps DISL Series
- Diaphragm Type Dry Vacuum Pump DTC Series
- Diaphragm Type Dry Vacuum Pump DAU-20/DTU-20
- Diaphragm Type Dry Vacuum Pump DA Series
- Diaphragm Type Dry Vacuum Pump DAP Series
- Dry Vacuum Pump CR Series
- Dry Vacuum Pump LR/HR/UR Series
- Dry Vacuum Pump CR Series Version B
- Dry Vacuum Pump GR Series
- Rocking Piston Type Dry Vacuum Pumps DOP Series
- Oil Rotary Pumps
- Mechanical Booster Pumps
- Ion Pumps
- Turbo Molecular Pumps
- Oil Diffusion Pumps
- Cryo Pumps
- Accessories
- Dry Pumps
- Vacuum Gauges
- G-TRAN Series Pressure Switch Unit (SAU)
- Ceramic Capacitance Manometer, CCMT-D Series
- Extreme High Vacuum Gauge AxTRAN
- G-TRAN Series Pirani Gauge Sensor Unit SP1
- Atmospheric Pirani Gauge Combo SW1 & ISG1
- G-TRAN Series 4CH Display Unit IM1R1, IM2R1
- Cold Cathode Gauge Sensor Unit G-Tran Series SC1
- Multi Ionization Gauge G-TRAN Series ST2-1, ST2-2
- Smartphone-Direct Pirani Gauge SWU10-U
- Process Gas Monitor
- Leak Detectors
- Thin Film Measurement / Deposition Controller
- Vacuum Valves
- Power Generator
- Molecular Interaction Analyzer
- Thermal Analysis
- Vacuum Pumps
- Equipment
- By technology
- By application
- Advanced Packaging Device
- Architectural Glass
- Automobile Parts
- Automotive
- Aviation – Airplane Parts
- Air Conditioning and Refrigeration (ACR)
- Decorative Coating
- Electronic Materials
- EMI Shielding
- Food & Medicine
- Food Processing
- Health Care
- Functional Materials
- Display
- LED Device
- Magnetic Device
- Magnet Materials
- MEMS Device
- OLED
- Optical Film
- Pharmaceutical
- Photovoltaic
- Power Device
- Medium Current Ion Implanter SOPHI-400
- Activation Annealing System Ailesic-2000
- Oxidation-Nitridization-Annealing System Ailesic 1400-1700
- High-temp Ion Implanter for SiC IH-860PSIC
- Medium Current Ion Implanter SOPHI-200/260
- Dry Etching System for Production NE-5700 & NE-7800
- Load-lock-type Plasma CVD System CC-200/400 PD
- Back Side Metallization Sputtering System SRH-530 pd
- R&D Equipment for Displays
- Semiconductor Process (FEOL/BEOL)
- Semiconductor Process (Non Volatile Memory)
- Thin Film Deposition
- Thin Film Battery
- Touch Panel
Medium Current Ion Implanter SOPHI-200/260
This tool, SOPHI-400, basically inherits exisiting medium current production model ion implanter, and remove over specification based on our sufficient experience as tool supplier. Therefore, thanks to effective cost reduction, we can offer inexpensive sales price with parallel scan capability.
- Applicable for 4 – 8 inch wafers.
- Compact and light weight tool.
- Excellent parallel beam performance.
- Excellent for engergy and metal contamination.
- Applicable for ultra thin wafers.
- 400kV single / 800kV double / 1,2MV for triple charge
- Proton implantation available
Special Features / Further Applications
- Semiconductor production.
- Ultra thin wafers process such as power devices, etc.
- Proton implantation
- R&D
